Ultra-fast macro inspection for non-contact wafer control (200nm/300mm) – Semiconductor industryDevelopment Goals:

  • Comprehensive inline inspection of defects
  • High sensitivity of up to 0.5 microns at high throughput of 120 Wph
  • High stability and low cost-of-ownership due to a “no-moving parts” design

 

task:

  • concept development and construction
  • production and assembly support of the prototypes
  • CE and Semi certification
  • series redirection

Ultra-fast macro inspection for non-contact wafer control (200nm/300mm) – Semiconductor industryIn the scope of the project :

  • optimize camera properties with better cooling, EMC protection, and shutter integration
  • realization of a camera adjustment concept with a reproducible 3-point support
  • mechanical development of the lens and tube lens
  • integration of incident lighting
  • Development of a filter wheel
  • construction of a filter wheel with two separate drives

Ultra-fast macro inspection for non-contact wafer control (200nm/300mm) &#8211; Semiconductor industry< img class="wp-image-430 size-medium alignright" src="https://www.optomech.de/wp-content/uploads/2016/04/Optomech-Projekte-16-300x200.jpg" alt="Macro Inspection - Non-contact Wafer Control - Semiconductor Industry" width="300" height="200" />

 

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