Deep UV illumination system

4,160.00 

The Deep UV illumination system consists of “lamp house lh-qx-100.60” with integrated ignition and “ballast ebqx 100-04” for 100 W HgXe lamps.

delivery time: 6-weeks

SKU: 13780/8708 Category: Tags: ,

With the LEJ Deep-UV illumination system you get an extremely stable UV radiation due to the low thermal drift and the very stable DC power supply by our ballast. Furthermore, our system allows reproducible mechanical adjustment of lamp, mirror and collector. Thus, the LEJ Deep-UV system is very suitable for wafer inspection and for illumination during optical review and analysis of photomasks, especially of structures and linewidths for defects and flaws.

    • No thermal drift
    • Reproducible mechanical adjustment
    • Ignition integrated in the lamp house
    • Compact lamp house
    • Interlock function
    • Lamp life monitoring

APPLICATION AREAS: Wafer inspection, Analysis of photomasks, Structure review, Line width analysis, Defect detection